Used KARL SUSS / MICROTEC MA 200 #9395433 for sale

ID: 9395433
Wafer Size: 6"-8"
Vintage: 2004
Mask aligner, 6"-8" 2004 vintage.
KARL SUSS / MICROTEC MA 200 is a full-field projection aligner used for qualitative alignment and photolithography of substrates in the submicron range. The equipment is perfect for working with a wide variety of materials, substrates, doses, and features sizes, making it ideal for a variety of research, development, and production applications. MICROTEC MA200 features a unique non-scanner alignment system that uses wide field imaging optics and field uniformity to accurately align each substrate quickly and precisely. This allows for the precise registration of substrates for the photomasking and etching processes. The high-end alignment unit within KARL SUSS MA-200 uses digital imaging and precise linear and rotational control of the mask to ensure precise alignment of substrates with the photomask. This machine has been optimized to facilitate optimal overlay matching, which is important in the alignment of small and complex designs as found in microelectronics and MEMS. The feature size of KARL SUSS MA 200 is minimal, allowing for precise alignment at angles as small as 0.2 mrad. This feature size is found in many commercial aligners, however MA200 is particularly advantageous in its ability to accurately and precisely align very small features. KARL SUSS MA200 is automated and comes with multi-wear parts and user-replaceable optics, allowing users to reduce their operational costs while maintaining the highest quality standards. The automated transport wafer handling tool allows for quick loading of substrates and masks, reducing the time needed for photolithography. The automated maintenance asset ensures optimal performance from all components, reducing the need for manual maintenance. MA-200 provides top-of-the-line features for precise and accurate alignment of critical features. Its non-scanner technology, wide field imaging optics, and sensitive digital imaging and control systems allow users to create high-quality masks with consistently excellent results. The combination of advanced technology and reliable performance makes it a great choice for research, development and production applications.
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