Used KARL SUSS / MICROTEC MA 200 #9396119 for sale

KARL SUSS / MICROTEC MA 200 is a modern and highly efficient semi-automatic mask aligner designed to perform intricate and precise photolithography in the field of microelectronics. This robust machine features a unique and advanced layer alignment equipment and provides highly accurate alignment under a wide range of conditions. It also contains a highly advanced and easy to use user interface that allows users to control all of the aligner's functions with increased accuracy and efficiency. MICROTEC MA200 is equipped with an advanced layer alignment system that is designed to provide superior alignment and decreased registration error compared to other mask aligners. This unit utilizes a linear concomitant drive that optimizes the printer's ability to finely adjust the layer position for optimal alignment accuracy. The simultaneous movement of both the carrier and the steering wheel makes the alignment extremely precise and has been formulated to reduce registration error. The layer alignment machine is also accompanied by an easy to use user interface that allows users to quickly and easily adjust the parameters of the machine with greater accuracy than ever before. Another key feature of KARL SUSS MA-200 is its wafer handling tool. It is equipped with an advanced 6-axis wafer handling mechanism that allows for precise and accurate placement of the wafer fine stepper. This allows users to quickly and accurately place and align the wafer for photolithography without ever having to touch the wafer. It also has a gripper asset designed to safely and accurately pick and place the wafer on the mask, furthering ensuring precise alignment. The powerful wafer handling model can also be used to create a variety of different processes to ensure a perfect result in each operation, from UV and visible lithography, to electron beam and even to X-ray. Overall, MICROTEC MA 200 is a superior mask aligner with a unique and reliable layer alignment equipment and an advanced wafer handling system. It has been designed to meet the needs of modern microelectronics and to make photolithography easier than ever before. With its easy to use user interface and its advanced features, it is certainly one of the most advanced mask aligners on the market today.