Used KARL SUSS / MICROTEC MA-210 AA #293654297 for sale
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KARL SUSS / MICROTEC MA-210 AA Mask Aligner is a high-end instrument used in the lithography process of creating various electronic devices. It is used to produce photomasks, which are used to create highly precise patterns on semiconductor wafers. MICROTEC MA-210 AA Mask Aligner has two main components: a UV projection equipment and a two-dimensional (XY) stage. The UV projection system includes a DUV optical ellipsoidal reflector, a power supply unit and a sealed UV excimer laser. The laser produces a light of 248 nanometer wavelength which is collimated by the reflector, producing an exact image of the photomask that can be projected onto a desired wafer layer. The image size is between 0.25mm and 12mm with a resolution of 0.25μm. A microscope is also included, providing 10x to 50x magnification for highly accurate alignment of the mask and wafer layers. The XY stage of KARL SUSS MA-210 AA Mask Aligner is driven by a DC motor, and offers three manual/automatic operation modes. In manual mode, the stage can be controlled manually with a joystick and digital display, providing up to 0.2mm accuracy. In automatic mode, the stage can be programmed for various jobs, with a repeatability and accuracy of 0.1mm. An overlay measurement unit is also available for high precision alignment of the mask and wafer layers, using a reflected laser light for detection. MA-210 AA Mask Aligner is equipped with an automatic wafer alignment machine, featuring three V-groove systems which can be modulated electronically. An integrated wafer lift tool allows for efficient loading and unloading of up to 200 wafers with a diameter up to 200mm, offering high efficiency and productivity in the lithography process. KARL SUSS / MICROTEC MA-210 AA Mask Aligner features a programmable computer interface allowing software control of all aspects of the aligner, including laser power and detector signals. It includes a number of safety features, such as a shutter for the UV optical asset, as well as an interlock model for preventing unauthorized use of the aligner. In summary, MICROTEC MA-210 AA Mask Aligner is an advanced tool for creating high-precision photomasks used in the fabrication of semiconductor devices. It features an advanced UV projection equipment, a two-dimensional XY stage, an automatic wafer alignment system, and a programmable computer interface. By offering repeatability and accuracy, as well as a number of safety features, KARL SUSS MA-210 AA Mask Aligner can contribute to the successful fabrication of semiconductor components.
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