Used KARL SUSS / MICROTEC MA 25 #293601585 for sale

KARL SUSS / MICROTEC MA 25 is a benchtop Mask Aligner that provides photolithography capabilities for a variety of applications. This system is ideal for prototype semiconductor device fabrication and evaluation, as well as performing process development research. It utilizes advanced exposure optics, precision motion stages and an intuitive operator interface to provide fast, repeatable results. MICROTEC MA 25 is equipped with an optical head that can be used for angled and circular illumination for specialized applications. It features a patented 3.2nm rastering system for a high degree of precision and accurate alignment. The optics lay out is suitable for a variety of substrates, from micrometers to millimeters, with a large working distance of over 8 inches (20.3 cm). KARL SUSS MA-25 has a variety of exposure techniques, including classical contact printing and proximity printing. Intensity control and pulse-pattern exposure are also available. In addition, it has variable dose control and a programmable energy ramping feature. These features ensure accurate alignment and exposure, as well as improved process control, with up to 40 times lower dose control. KARL SUSS / MICROTEC MA-25 is designed for both low- and high-volume production, and can handle a wide range of masks and substrates. It possesses a Z-Axis focal distance that is capable of focusing to 50 micrometers with a discrete digital surface scan. It also features adjustable mask-to-wafer gaps and constant scan-rate-tracking precision. To maximize user safety, MA-25 has a full enclosure, which also helps eliminate contamination from particulates and other sources. The enclosure also features active cooling to keep the system running at peak performance and minimize potential damage from overheating. Overall, MICROTEC MA-25 is an excellent choice for a variety of photolithography applications. It is highly accurate, reliable, and features the latest in exposure technology for the most precise alignment and exposure settings.