Used KARL SUSS / MICROTEC MA 4 Series III BSA #293639816 for sale

KARL SUSS / MICROTEC MA 4 Series III BSA is a high-precision mask aligner designed for use in advanced semiconductor processing applications. The device features a uniform surface optical equipment with a quartz mask blank for utmost accuracy and repeatability. It is capable of accommodating wafers up to 200mm (greater on a special order basis) and can expose substrates up to 40mm thick. MICROTEC MA 4 Series III BSA is equipped with a calibrated nanometer stage that utilizes a unique x-y-θ triple alignment system to precisely control both the angle and the x-y position of the wafer or mask blank. The four point top and bottom contact mechanism ensures that the optical exposure is centered and consistent across the entire exposure area. This device also has a unique airflow unit that utilizes four diffusion chambers to reduce air turbulence and temperature fluctuations during exposure, allowing higher exposure doses, reduced sheet resistance and improved yields. In addition, the machine is designed to reduce the risk of contamination with advanced liquid and particle removal technology. This helps ensure quality and accuracy, as well as reduce excess power consumption. KARL SUSS MA 4 Series III BSA also features an advanced optical tool designed to improve alignment accuracy. It features a laser patterned reticle for high accuracy pattern recognition and double sided exposure for top and bottom sides exposure. It also has a four axis exposure capability and is equipped with advanced optical filters for improved performance. The asset is also designed with safety in mind. It is equipped with safety interlocks to prevent users from entering dangerous areas, such as the exposure chamber during operation, as well as audible and visual alarms to alert users to any potential hazards or exposure problems. MA 4 Series III BSA is designed to provide expert, precise mask alignment for advanced semiconductor processing. It features advanced optics and calibration technologies for consistently accurate exposures, as well as a contamination-resistant airflow model that helps prevent contamination. It also features safety interlocks and alarms for maximum safety and protection.