Used KARL SUSS / MICROTEC MA 45 #9140519 for sale
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ID: 9140519
Wafer Size: 4"
Mask aligner, 4"
Front side alignment
Split field microscope.
KARL SUSS / MICROTEC MA 45 Mask Aligner is a leading-edge tool used in the manufacture of microelectronic components. This highly precise equipment enables device manufacturers to precisely place, align, and transfer a photoresist (PR) layer onto a chip in the most uniform possible manner. MICROTEC MA 45 can be used for large, small, or medium dimensions, making it the perfect tool to meet the demanding needs of today's electronics industry. KARL SUSS MA-45 is based on a scanning masking system. This unit works by submerging the chip into a liquid chamber filled with photoresist. MA-45 then scans the chip to detect the features to be transferred, before using a light source to focus on the exact locations of each feature. This process is repeated to ensure that the entire chip is fully covered with the PR masking. KARL SUSS / MICROTEC MA-45 utilizes a very powerful light source, allowing it to rapidly and precisely transfer intricate patterns. The uniformity of this process is ensured by MA 45's stability control, which provides an extremely consistent transfer rate across the entire chip. This process helps minimize transfer errors, ensuring a highly uniform PR layer on the chip. MICROTEC MA-45 is extremely easy to use and maintain. It requires minimal physical setup and consumes relatively low power. As well, it comes with a wide range of settings to precisely control the masking process, ensuring that each chip is accurately and repeatably masked. Additionally, KARL SUSS MA 45's software is highly user friendly, helping to optimize the masking process even further. In summary, KARL SUSS / MICROTEC MA 45 is an exceptionally advanced masking machine capable of providing extremely precise, uniform coverage of photoresist layers onto electronic chips. MICROTEC MA 45 is also incredibly easy to set up, configure and maintain, ensuring that device manufacturers can get the most out of their masking process.
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