Used KARL SUSS / MICROTEC MA 45 #9159265 for sale

KARL SUSS / MICROTEC MA 45 mask aligner is a specialized equipment designed for accurately and precisely aligning or 'exposing' layered photomasks onto substrates like wafers. The aligner performs by first scanning and automatically aligning the entire wafer, prior to exposing each separated mask and layer of the mask. Through the use of an automated laser-based scanning system, the alignment accuracy can be maintained during extended runs without re-alignment of the mask. This makes the unit highly suitable for industrial applications as well as research and development processes. MICROTEC MA 45 mask aligner consists of a stage that holds the substrate (usually a wafer) and a 'board' where the photomasks are placed. The optical machine of the aligner is mounted over the mask and substrate. To expose each layer or mask, this optical tool precisely aligns the mask over the wafer. The alignment is typically performed with an accuracy of about one micrometer. KARL SUSS MA-45 mask aligner utilizes a bright source of UV light for exposing each layer of the mask. The light is projected through the photomask and then onto the wafer. This is followed by the application of a developer. The developer is used to remove the unwanted photoresist material from the area of the wafer exposed to the UV light, leaving behind the image or pattern desired. The mask aligner's asset is composed of several modules that can be individually configured for specific applications. These modules provide Stepper Motor control, Laser Spotting, Imaging, Optical Alignment, and Wafer Fixturing functions. The mask can be exposed in a batch mode or one wafer at a time. The optical projection model of the aligner is comprised of a telecentric objective and digital image analysis unit. The microscope also includes a diode array and CCD camera with an interface, which allows for the capture of the mask image, in order to measure and determine the alignment accuracy. MA-45 mask aligner is a highly precise equipment for aligning and exposing layered photomasks onto wafers. Its automated alignment mechanics and illuminated optical system allows for accurate and efficient alignment of multiple masks in a single run, making it a great choice for industrial and research settings. The unit's modular design further makes it adaptable to many different applications.