Used KARL SUSS / MICROTEC MA 55 #123195 for sale

KARL SUSS / MICROTEC MA 55 is a photolithography equipment designed for the precise alignment of photomasks with a variety of substrates. It is particularly well suited for the fabrication of microelectronic, micromechanical, and optoelectronic devices. MICROTEC MA 55 is a manual mask aligner with an 8x8 inch precision optical table and 10x microscope. It has a built-in two-dimensional (2D) alignment system for aligning the masks and substrates with a minimum of operator intervention. The unit is designed to provide both a planar and tilting alignment capability for both mask and wafer positioning. It is capable of maintaining ±0.4 micron performance when mated to a flat surface. KARL SUSS MA-55 offers a versatile, high-precision platform for photolithography. There are two separate control systems for masking and for wafer processing. Each has its own dedicated Windows-based software for data entry and manipulation. The mask control machine allows users to enter the mask data such as position figures, mask sizes and types, and overlay and misalignment. The wafer control tool allows users to enter the wafer data such as position figures, wafer shape, and wafer types. MICROTEC MA-55 offers high resolution optics, including a 10x microscope and a 5x microscope for magnifying alignment and viewing during the photolithography process. It also contains a low-power 5 megapixel digital CCD camera for photo taking and in-situ mask inspection. In addition, KARL SUSS / MICROTEC MA-55 incorporates a built-in air bearing slide rail asset for accurate mask alignment and wafer manipulation. The air bearing slide rail model ensures stabilized mask-to-wafer alignment allowing for sub-micron positional alignment accuracy. MA 55 supports a wide variety of photomasks up to 8 x 8 inches in size and a variety of wafer shapes. Its exposure lamp produces a precise, even field of illumination with intensities up to 10,000 Lux. All of the alignment and expose components are vacuum-sealed with an integrated gas filtration module to prevent contamination. MA-55 is a reliable and accurate photolithography equipment used in a wide range of industries. It delivers high alignment accuracy through its advanced optics, CCD camera, and air bearing slide rail system. The built-in gas filtration unit ensures clean and contaminant-free exposure for consistent results. With its versatile capabilities, this mask aligner is suitable for use in prototyping, research, and production of electronic, microelectronic, optoelectronic, and micromechanical devices.