Used KARL SUSS / MICROTEC MA 56 / MJB55 #9136941 for sale

KARL SUSS / MICROTEC MA 56 / MJB55 is a mask aligner equipment specifically designed for the accurate patterning and alignment of micro components. The MA 56 holds the substrate in an accurately-controlled vacuum-compatible chuck, while the MJB55 is a two-level alignment and x-y-z positioning system that performs all micro alignment and positioning functions. Together, they provide extremely high accuracy and repeatable results for al the masking and photolithography steps used in advanced microelectronic chip fabrication. The MA 56 utilizes a high-precision stage for flat substrate alignment and patterning, and is capable of delivering accuracy in the range of 0.1 microns (100 nanometers) in X, Y, and Z directions. The stage has a travel range from 400 x 400mm (15.7''x15.7''), with an accuracy of +/-2um (0.08"). The head is mounted on a uniaxal tilt angle stage, accurate to +/-10 arc second, and a 360-degree continuous rotation stage. The MJB 55 is a stage-controlled mask aligner unit with 6-axis of motion (x-y-z, θx, θy, and θz). It has a travel range from 70 x 70mm (2.75"x2.75"), with a positioning accuracy of +/- 2um (0.08"), and is capable of up to 2 deg/s rotational speed. It is also c capable of 3K speed scanning and is suitable for sub-micron accuracy. The MA 56 and MJB 55 can handle a wide range of mask sizes from 4" x 4" up to 12" x 12", and is compatible with both standard photo-imaging plates, and substrates. The machine also has a variety of features to ensure high accuracy, including automatic gap detection to ensure substrate parallelism, and a self-aligning step and repeat routine. MICROTEC MA 56 / MJB55 is the ideal tool for performing all the masking and photolithography steps needed for advanced IC fabrication. It provides accurate and repeatable results, and its wide range of features and capabilities make it an indispensable tool for chip makers looking for high-precision patterning and alignment of their micro components.