Used KARL SUSS / MICROTEC MA 56 #119483 for sale

KARL SUSS / MICROTEC MA 56 is an automated mask aligner designed for photolithography processes. It uses an ultra-precise, laser-based projection alignment equipment to increase the accuracy of aligning masks to the substrates on wafers during lithography processes. MICROTEC MA56 is designed for the fabrication of high-density semiconductor devices, including those for logic and memory applications, and is capable of providing sub-micron level accuracy for device alignments. KARL SUSS MA-56 is equipped with several features that make it an excellent choice for a variety of photomask alignment applications, while also enabling users to customize their process. It is outfitted with a large 8-inch mask field, which provides enough space to accommodate a wide range of sizes and geometries, including small and large format masks. Additionally, KARL SUSS MA56 has two independent projection aligners, both of which are capable of providing spot-on alignment with sub-micron accuracy. KARL SUSS / MICROTEC MA-56 features a modular design that enables users to customize the system to their specific production needs. It comes with a wide variety of lens options, each offering its own benefits for a particular application, such as resolution and depth of focus. The unit also has a variety of other optional components, such as an optical beam combiner for multilayer alignment, a scanner for pattern combining, and a wide range of projection objectives for alignment utilizing different wavelength lasers. MICROTEC MA-56 is capable of storing up to 6 masks, making it easy to quickly switch between different photomask sets. KARL SUSS / MICROTEC MA56 utilizes a wafer handling machine that enables precise subsets of wafers to be positioned accurately on the holder. The tool is also equipped with an auto-reflective alignment feature which quickly compensates for reflectivity of the surface and any scanner errors. Additionally, KARL SUSS MA 56 can be upgraded with advanced options such as an automated gap sensor and vacuum hole adjustment for improved performance and accuracy. In addition to having excellent mask aligning capabilities, MICROTEC MA 56 provides precise conditions for a wide range of substrates. It utilizes a precise temperature and humidity monitoring asset, so that the devices are fabricated in the optimal conditions. MA 56 is also equipped with an advanced safety model that prevents any accidents related to the equipment's operation when the equipment is running in a chemically sensitive environment. Overall, MA-56 is an excellent choice for precise mask aligning of high-density semiconductor devices. It is equipped with an advanced projection alignment system that can provide sub-micron accuracy and control. Additionally, MA56 provides a wide range of features and components that allow it to be customized to a variety of needs, while also providing precise conditions for a range of substrates.