Used KARL SUSS / MICROTEC MA 56 #293732395 for sale

KARL SUSS / MICROTEC MA 56 Mask Aligner is a precision machine utilized in microfabrication techniques for the transfer of patterns to substrates. The Mask Aligner is a tool for the alignment of photomasks with a substrate, using controlled illumination for photolithography applications. MICROTEC MA56 is a tabletop Aligner, which can handle 4-8 inch wafers and a variety of other substrate sizes. The core component of KARL SUSS MA-56 is the diffractive optical element, or DOE, a beamsplitter. This DOE splits the beam, generating partial beams of different ratios that gives KARL SUSS / MICROTEC MA56 its distinct alignment capability. These partial beams can be modulated, allowing for precise alignment of the mask over the substrate. Additionally, KARL SUSS / MICROTEC MA-56 is equipped with an adjustable gas pressure chamber, which can be utilized to control the pressure of the substrate during photolithography processes. KARL SUSS MA56 allows users to control and select a wide range of parameters related to the alignment and overlay process. These parameters can include the size of the fields, the amount of light, the intensity of the light, the position of the light, the exposure time, and more. This allows users to customize their process to fit their individual tasks. MA-56 is a powerful and highly configurable tool. It has several features that increase its accuracy and repeatability such as high resolution and fine movement capabilities, as well as automatic pattern alignment and Auto-Mask Aligner control. This makes it suitable for production and complex research applications. Additionally, the user-friendly interface, with LCD touch screen, allows for easy navigation of the various functions. Equipped with an array of features, MICROTEC MA 56 Mask Aligner is an optimal tool for photolithography and microfabrication processes. Its piezoelectric stages allow for the accurate alignment of mask and substrate materials, while its adjustable gas pressure chamber allows for precise pressure control. Additionally, its advanced microprocessor-driven system and user-friendly interface increases the accuracy and repeatability of the model over a wide range of applications and process types.