Used KARL SUSS / MICROTEC MA 56 #9080239 for sale

KARL SUSS / MICROTEC MA 56 is a mask aligner designed for use in photolithography applications such as production of semiconductor devices. It is a high-precision equipment that allows for fast and accurate transfer of pattern from a negative film master to a wafer. It is capable of operating at 200 mm and 157 mm wafer sizes, with minimum feature size of 0.5 micron. The system consists of two main components, the mainframe and the head unit. The mainframe is the base unit which contains the mask stage, illumination source and optical components. The head machine is mounted on top of the mainframe and consists of an XY stage and a Z-axis drive for controlling the position of the substrate during exposure. The head also houses the projection optics, which focuses the image of the master onto the substrate. The mask stage employs a vacuum chuck as the holding mechanism for aligning the negative film onto the mask plate. It is equipped with a microscope to ensure precise alignment of the film. The illumination source contains both mercury and halogen bulbs to provide different wavelengths of light to match the mask material. The XY stage allows for step and repeat alignment of the film over the substrate. It has an accuracy down to a micron, allowing the user to perform precise alignment of the film onto the substrate. The projection optics is a highnumerical aperture lens tool that focuses illumination from the bulbs onto the substrate. It is extremely precise, with a resolution down to 0.5 micron. The Z-axis drive allows for precise control of the substrate position during exposure. MICROTEC MA56 is an ideal solution for photolithography applications, providing fast and accurate transfer of pattern from a negative film master to a wafer. Its high precision components and features enable manufacturers to quickly and precisely produce semiconductor devices.