Used KARL SUSS / MICROTEC MA 56 #9124210 for sale

KARL SUSS / MICROTEC MA 56 is a mask aligner that is used for photolithography applications. It has a three-axis automated stage allowing alignment of the masks and substrates at the same time, making it suitable for high-precision applications. The unit is compact and lightweight, allowing for easy portability between production sites and labs. MICROTEC MA56 is programmable through a user-friendly software, featuring an intuitive graphical user interface (GUI) and guided help menus. The GUI allows users to easily select relevant parameters and accurately set up the desired parameter set. KARL SUSS MA-56 comes with two cameras, one for generating field of view images and another one for aligning the masks and substrates. MA 56 features a patented pinpoint laser system that can detect small imperfections in the masks, enabling high accuracy alignment and integration of patterns ranging from single micro structures up to 25 mm. Its open architecture allows for easy integration with other components of a production process, including mask and wafer handling systems. The unit is designed to provide maximum image quality, with two different lenses for different wavelength ranges; UV and DUV. For UV application, an NA of 0.4 is provided for uniform loading and unloading of substrates of up to 150 mm diameter. These lenses are also compatible with secondary optics that allow magnification and improving accuracy. KARL SUSS / MICROTEC MA56 supports both standard Thin Film deposition systems as well as advanced GaAs etch systems, with an index marker reader to ensure easy positioning of the masks. It also features an internal software-controlled shutter, allowing users to choose between manual shutter mode and automatic shutter control. MICROTEC MA-56 is designed to allow very high precision alignment, with a minimum feature size of 0.5 μm. It also offers variable cycle time optimization algorithms, allowing for faster processing and higher throughput. Overall, KARL SUSS MA 56 is a versatile and high-precision mask aligner, suitable for even the most demanding photolithography applications. It provides superior image quality, automated alignment and high throughput processes with minimal user intervention.