Used KARL SUSS / MICROTEC MA 56 #9270575 for sale

KARL SUSS / MICROTEC MA 56 is a high-precision, automated mask aligner used for photolithography processes in industrial research and production. It is used to deposit and pattern thin films of photoresist, such as those used in semiconductor fabrication. MICROTEC MA56 is capable of 5-115 micron feature resolution, and is suitable for layers up to 500 nanometres thick. The machine employs an imaging system mounted on a servo stage to expose a photolithography mask onto a substrate such as a Si wafer. The substrate is then moved to a position near the imaging system, where it is aligned and focused. The machine is capable of both single-axis and double-axis alignment. It allows for a variety of alignment methods, such as automatic alignment, full-field-of-view measurements, targeting, cross-hairs and linear autofocus. KARL SUSS MA-56 uses a mass flow controller to precisely control the delivery of chemicals, such as photoresist and developer, onto the substrate. The process conditions, such as temperature, humidity, chemical concentration and flux, can be easily adjusted. The machine also offers a wide range of safety features and is compliant with current EMC regulations. MICROTEC MA 56 has an intuitive user interface and a highly configurable workflow. It is capable of running a variety of programming languages, including C, Visual Basic and Pascal. The machine can be operated remotely, allowing for remote observation and monitoring. Overall, KARL SUSS / MICROTEC MA-56 is a user-friendly, high-precision mask aligner that is suitable for a wide variety of photolithography processes. It offers a high level of accuracy and repeatability, and is capable of achieving feature resolution down to 5-115 microns. The machine is capable of performing both single- and double-axis alignment, and can be easily adjusted to optimize process conditions. Its intuitive user interface and remote operation make MA56 a valuable tool for industrial research and production.