Used KARL SUSS / MICROTEC MA 56 #9302582 for sale

ID: 9302582
Mask aligner Type: 10300112 MJB-55 Substrate size: 2.5" x 2.5" Can be modify upto 5" UV400 Optics Operation modes: Soft and hard contact Does not include cold light mirror LPS-1000 Power supply Lamp house: 350 Watts Manual included.
KARL SUSS / MICROTEC MA 56 is a mask aligner that uses optical lithography to produce microscopic structures in photoresist and other materials. The aligner consists of two main components: a mask holder and a stepping table. The mask holder is a mechanical platform which contains a height-adjustable mask holder, and which is used to move the mask in order to align it with the substrate. The stepping table is a stepper motor-driven platform which allows micro-level alignment of samples. MICROTEC MA56 is designed to provide high-resolution patterning and precise alignment of sub-micron structures from 200nm to 100nm and features a numerical aperture (NA) of 0.8/1. The machine is capable of producing patterns with feature sizes as small as 0.5um. It is also capable of performing exposure interval ranging from 365 nm to 365 nm with a step size of 0.5 - 20 microns and exposure time of 0.1 - 200ms. Furthermore, the machine is equipped with an automated focus control unit allowing the user to preset the desired focus, ensuring a perfectly tuned focus of the exposure stage. KARL SUSS MA-56 is powered by an extensive software package designed to facilitate the alignment process. It offers a wide range of alignment aids such as auto-exposure (AE), auto-focus (AF), auto-leveling (AL), focus recovery (FR) and pattern optimization (PO) tools. Additionally, the equipment is designed for versatility, as its modular design allows for exchangeable masks and a variety of substrate holding systems. All of these features work to create more precise and efficient lithography processes leading to a higher quality of device fabrication. MICROTEC MA 56 is a reliable and highly accurate optomechanical tool for Photolithography applications, used to produce intricate patterns and submicron structures using the power of optical lithography. It offers an extensive range of features for precise and efficient lithography, allowing a faster and more accurate means of pattern alignment for device fabrication.
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