Used KARL SUSS / MICROTEC MA 56 #9382959 for sale

KARL SUSS / MICROTEC MA 56 is a semi-automated, ultra-precise mask aligner designed for industrial photolithography applications such as photomask fabrication, wafer imaging and multilayer process integration. MICROTEC MA56 can align a mask (transparency) with a wafer (silicon wafer layer) to a nanometer level of accuracy, enabling the precision placement of patterns on the wafer. KARL SUSS MA-56 features a robotic actuation system which enables precise height and electromechanical alignment of a mask onto a wafer with a repeatability of 0.5um. The unit utilizes an intuitive computer control system which allows for easy set-up and operation. KARL SUSS / MICROTEC MA-56 features dual laser positioning systems with high resolution powder diffraction autofocus and optical interference for optimum alignment accuracy and repeatability. The XY stage features built-in digital read out, enabling alignment accuracy of up to 0.25um in the X and Y axes. This mask aligner also offers a wide range of optical and mechanical options to facilitate the production of precision photomasks for wafer level manufacturing. Additionally, MA 56 includes various exposure systems and options such as a pulsed diode laser, spot beam generator, light source and alignment magnification microscope. Various optical components such as filters, lenses, beamsplitters, and projection optics provide intense light radiation (typically in the ultraviolet and visible wavelength range) and the ability to vary the beam size from 25 to 400 microns. MA-56 is suitable for a wide range of applications that require tailored and precise mask-to-wafer alignment. It is the perfect solution for customers who require precise pattern transfer for intricate photomasks and is well suited for die-to-die, cell-to-cell, and wafer-level packaging (WLP).