Used KARL SUSS / MICROTEC MA 6 / BA 6 #293639160 for sale

KARL SUSS / MICROTEC MA 6 / BA 6 is a mask aligner from MICROTEC, a manufacturer of precision equipment for the semiconductor industry. The MA 6 and BA 6 mask aligner systems offer accurate, repeatable results for high-end photolithography applications that require nanometer-level resolution. MICROTEC MA6/BA6 mask aligner has a Z-axis resolution of 0.01 microns and a minumum step size of 0.12 microns. It is capable of positioning a substrate with a repeatability of < 0.1 microns. The positioning table has a linear scale measuring 700 mm by 600 mm and is capable of accurately positioning substrates with a maximum size of 12". The machine is equipped with a dual-beam equipment that provides fast alignment times with split-field measurement capability. The dual-beam system contains two laser diode interferometer/position feedback systems which provide nanometer-level position accuracy and allow for rapid alignment. It is also equipped with a high-resolution telecentric optics module that provides a field of view with a magnification of 30x or greater. KARL SUSS MA6 / BA6 unit offers several features to ensure reliable results and minimize the risk of defects. To reduce the risk of contamination, the machine is equipped with an autofocus exposure tool which keeps exposure wavelengths consistent. It also has a vacuum hold which prevents any substrate movement during exposure. To minimize the risk of scratches or dents on the substrate, the asset is designed with air cushion capabilities. The model also offers a wide range of exposure sources, such as high-power mercury arc and XeCl exposure lamps, which provide super-high precision patterning with exposure times of less than one second. Additionally, the built-in UV and IR filters provide a clean working environment, minimizing the risk of substrate absorption of any kind of radiation. Finally, KARL SUSS / MICROTEC MA6/BA6 mask aligner is also equipped with an extensive array of diagnostic and service tools, allowing measurements, inspections, and performance tests with full tool control, making it ideal for research and development. Due to its versatility, robust design, and accuracy, MICROTEC MA-6 / BA-6 mask aligner is an ideal tool for any precision photolithography application.