Used KARL SUSS / MICROTEC MA 6 / BA 6 #9226441 for sale
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ID: 9226441
Vintage: 2018
Mask aligner
Manual alignment stage:
Automatic wedge compensation system: Contact / Without contact (Mask and wafer)
Alignment gap program:
1 - 1000 Micron
1 Micron resolution
Movement range mask aligner mode:
X ±10.0 mm, Y ±5.0 mm, Theta ±S"
Movement range bond aligner mode:
X ±3.0 mm, Y ±3-0 mm, Theta ±3°
Machine base with mechanical, pneumatic and electrical equipment
Adapter system:
Mask holders: Up to 7" x 7" maximum
TSA Microscope stage:
X, Y Manipulator (Motorized)
Manual rotation
Wafers / Substrates: Manual loading and unloading
Microprocessor control with LCD display
Lithography applications
Wafers: 2" Up to 150 mm Diameter
Substrates: 2" x 2" Up to 6" x 6"
Bond application
Wafers: 3" Up to 150 mm diameter
Operator manual on CD
BSA Microscopes with working distance 33 mm
Alignment stage:
X, Y Theta
WEC Head for BSA microscope objective separation in X direction 15 mm to 100 mm
Motorized Z axis
Bottom side alignment system:
Separation in X: 15 mm - 100 mm
Travel in Y: - 20 mm to + 50 mm
Motorized focus: 6 mm
Enhanced Image Storage System (EISS):
PC With image and fine focus control
M 306 / 8, DVM 6/8 and BSA
TFT Flat screen, 17"
Integrated trackball
S-VGA Resolution: 1280 x 1024
SUSS DVM6 Microscope:
(2) CCD Cameras
Objective separation: 47 to 140 mm
Single objective UMPL FLI
Working distance: 20 mm
Exposure unit:
Wafer / Substrate: 150 mm
Exposure lamps: Up to 500 W
2018 vintage.
KARL SUSS / MICROTEC MA 6 / BA 6 is a manual mask aligner used for high precision nanolithographic patterning for photomasks and substrates. This machine is used in mass production, research, and development of devices involving microscopic features. It is an automated tool for aligning masks or substrates with 10nm accuracy and step repeatability. MICROTEC MA6/BA6 is ideal for patterning photomasks and substrates due to its extreme accuracy and repeatability. It is an advanced optical lithography tool that features two separate chambers, namely the Mask Chamber and Substrate Chamber, for enhancing accuracy and repeatability. The Mask Chamber has a 180-degree swing-out door for loading and unloading of up to two masks in any alignment configuration. It features two 5-position upgradeable mask tables for easy mask mask aligning. The Mask Chamber also offers the possibility of manual or automated translation and rotation via a motorized XYZ stage. The Substrate Chamber has a 180-degree swing-out door for loading and unloading of up to four substrates in any alignment configuration. It also features a 5-position upgradeable substrate table for easy substrate aligning. The Substrate Chamber offers the same manual or automated translation and rotation via a motorized XYZ stage as the Mask Chamber. KARL SUSS MA6 / BA6 uses an advanced illumination system to ensure precise mask-to-substrate alignment and exposure. It combines both LED and mini-halogen lamp illumination sources for optimum intensity control and convey uniformity. The system also offers a choice of various alignment modes such as fully automated, semi-automated, and manual for different applications. It also features a software-controlled movement detection technique to ensure superior positional accuracy with both available beam sources. MA 6/BA 6 is an excellent choice for advanced lithography applications as it offers unmatched accuracy, repeatability, and speed. It is a reliable and cost-effective tool for scaling up R&D and mass production in various fields, including microelectronics, MEMS, opto-electronics, and magnetic storage.
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