Used KARL SUSS / MICROTEC MA 6 #293600857 for sale

KARL SUSS / MICROTEC MA 6 is a state-of-the-art mask aligner designed for photolithography applications in the semiconductor industry. It features a high-precision automated alignment equipment that is capable of combining precision masking and wafer stages with a unique scanner for fine adjustment. MICROTEC MA6 also provides extremely high accuracy for all optical components, allowing for superior image reproducibility in demanding lithography processes. KARL SUSS MA-6's alignment system is capable of 0.15µm fine-positioning accuracy using a combination of two types of stages: a precision masking stage and a high-precision wafer stage. The masking stage uses two precision 5-axis piezo actuators with a range of 100µm to achieve superior alignment of the mask and the wafer. The high-resolution scan head is designed to achieve alignment of the mask and wafer with a precision of 0.3µm. MA6 includes a full suite of control software for optimizing lithography performance. The condition of both mask and wafer stages are constantly monitored, providing superior reliability for complex lithography processes. The software can be used to scripting the alignment process or optimizing the unit for specific applications. KARL SUSS / MICROTEC MA-6 is equipped with a number of advanced features for superior lithography results. It features a high intensity UV laser source, providing exceptionally uniform exposure of the wafer. The imaging machine also includes an advanced tool for measuring the light intensity, ensuring perfect exposure levels for every point in the exposure. Furthermore, micron-scale alignment of the mask and wafer is provided by the precision 5-axis piezo actuators. KARL SUSS MA 6 is suitable for a wide range of lithography applications, including scribing, contact printing, inkjet printing and photoresist reflow processes. The asset's high accuracy, precision, and versatile control software make it an ideal choice for advanced photolithography. With the right combination of mask and wafer stages, KARL SUSS MA6 can be configured to meet the challenging demands of modern lithography processes.