Used KARL SUSS / MICROTEC MA 6 #9116715 for sale
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ID: 9116715
Mask aligner
6” Topside and 3” backside IR
Split field microscope with (6) objectives
Resolution: 1 Micron upto 6" wafers
BSA Chuck for 3" wafers included
Power supply: 1000 Watts.
KARL SUSS / MICROTEC MA 6 is a mask aligner designed for photolithography processes. It is a highly reliable and accurate tool for microscope patterning operations and is well suited for device manufacturing, nano-fabrication, direct writing and thin-film deposition. At the heart of MICROTEC MA6 is its precision alignment technology. The instrument utilizes a 'self-aligning equipment' to rapidly and accurately register overhangs and undercuts. This system enables the user to accurately locate desired feature locations with a repeatable accuracy of 10nm. The mask aligner is microprocessor-controlled, allowing for easy operation and programming. The PA 6 is also equipped with a 9.7-inch LCD panel. This panel displays pattern data as well as parameters for stage control as well as aligner settings. Furthermore, an 18-inch monitor is included for reviewing data that is separately output to an on-site printer. KARL SUSS MA-6 is equipped with an efficient exposure light source. This light source offers controllable output over a broad spectrum, ranging from UV and visible through to infrared. This light source also enables high uniformity of exposure across the wafer. The mask aligner uses a full-field optical alignment unit which allows the user to view, measure, and adjust the field-position of the mask. This machine ensures precise overlay alignment across the wafer, reducing the chance of non-uniform exposure. KARL SUSS / MICROTEC MA6 is also equipped with a range of stage and handling systems, including a choice of manual and automated stages. Stages are either manual or automated depending on the user's most suitable requirements. The accuracy of these stages is 10nm with an average stage vibration rate of 0.1µm. MICROTEC MA-6 is an ideal solution for those looking for precision, accuracy and reliability. The mask aligner's flexibility and features ensure it meets the demands of many photolithography processes and offers high-quality patterning across a wide range of substrates.
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