Used KARL SUSS / MICROTEC MA 6 #9179543 for sale

KARL SUSS / MICROTEC MA 6 is a high end mask aligner that is used for mask pattern alignment for the UV nanolithography process. This is a tool for semiconductor manufacturing and photomask fabrication. It is capable of providing 6 inch wafers with sub-micron alignment capability and is used for fine patterning of microelectronic components. MICROTEC MA6 features a unique beam scanning equipment that includes four mask autofocus engines for a total of 8 autofocus sensors. These provide high-resolution optical pattern recognition that is used for automatic realignment and corrections of the patterns on the mask. The high-resolution imaging system is also capable of detecting minor distortions in the mask as well as pixel resolution down to 0.3 microns. The tool is designed to offer high throughput and fast alignment times, with the cycle time for a 6 inch wafer being less than 6 minutes. The user can be assured of high yield and accuracy through the automatic alignment and optimization, which is achieved by the on-board software. The unit is also compatible with advanced layout editing software. The machine is designed to be integrated into an existing lithography environment and is equipped with both low- and high-voltage power supplies that can provide up to 150 watts of power for high throughput applications. Furthermore, the power is adjustable to ensure constant resistivity and uniformity of exposure, thus enabling exacting control over annealing response. KARL SUSS MA-6 offers a comprehensive set of user controls, including adjustment of the exposure time, the exposure area, and the beam diameter. Furthermore, it is possible to make small adjustments to the focus, alignment area, and beam formats via touch pad control. In addition, the tool is equipped with additional features that enable pattern deblurring and reticle addition. MICROTEC MA 6 is a reliable and accurate mask aligner. It offers a comprehensive range of features and provides users with a reliable tool that is capable of delivering sub-micron alignment and with high throughput. MA 6 is suitable for various mask patterning needs, including those related to photomask fabrication processes and semiconductor manufacturing.