Used KARL SUSS / MICROTEC MA 6 #9242865 for sale

KARL SUSS / MICROTEC MA 6 is a state-of-the-art mask aligner used in the field of lithography. It combines a unique, high-performance optical equipment with a highly precise mechanical alignment system thus providing high accuracy without losing throughput or process reliability. The unit is suitable for laser direct imaging as well as for immersion lithography and soft mask lithography. The fully automatic alignment of the wafer to the reticle ensures accuracy and repeatability of the alignment process. The optical machine of MICROTEC MA6 consists of three main components: a large field-of-view camera, an image rotation tool and a long working distance microscope. The camera captures a high-resolution image of the entire mask, which is then coupled with the image rotation asset for precise alignment of the substrate to the mask. The microscope then images the small area of interest with sub-micron resolution. The optical model provides a large field of view, allowing for accurate alignment and short align times while maintaining a high resolution. The equipment is also capable of full overlay measurements, allowing for fine-tuning of the alignment parameters. The mechanical alignment system provides precise control of the wafer positioning. The unit uses a unique 6-axis alignment stage, allowing for precise positioning of the substrate in three dimensions. The range of motion is optimized to ensure precise placement of the wafer in relation to the mask. Additionally, the machine incorporates a dovetail tool for precise rotational alignment and tilt correction of the wafer. KARL SUSS MA-6 is designed for high-volume production environments, providing excellent alignment accuracy as well as throughput. The asset is ideal for metrology and quality assurance applications, providing accurate measurements for reticle evaluation and process optimization. The combination of advanced optical and mechanical systems enables the model to provide fast, accurate and repeatable results for all types of applications.