Used KARL SUSS / MICROTEC MA 6 #9286934 for sale

KARL SUSS / MICROTEC MA 6 is a fully automated, high-precision, contact-type alignment equipment for photolithography. It is designed for semiconductor processing and can be used to align and pattern wafer-level mask layers with sub-micron accuracy. The system features a state-of-the-art XYZ alignment stage for precise positioning and measurement. MICROTEC MA6 comes with a 25x visual microscope for defect inspection, with a field of view of up to 700x for mask and wafer alignment, and has two independent 12-station magazine systems for mask loading. The microscope can be used for alignment, process inspection, surface metrology, and wafer metrology. KARL SUSS MA-6 has direct view imaging with three cube corner reflectors to verify and pinpoint the exact position of the mask relative to the wafer. It can use scanning electron beam imaging, i-line exposure and memory-driven data management to store detailed process information. The unit is fully automated, and the main control software is capable of controlling upto fifty-nine process steps. The basic KARL SUSS / MICROTEC MA-6 machine includes two sets of mask alignment stages, a sample stage for thewafer, a mask alignment sensor, and a light source, as well as dedicated mask alignment software and alignment detection subsystems. The built-in metrology subsystem allows for precise measurements of the wafer-mask alignment. It also has a user-friendly graphic interface, as well as a range of additional automation and engineering options. MICROTEC MA 6 tool is used for a variety of semiconductor technologies, including photomask fabrication, MEMS fabrication, 3D integrated circuit and microfluidic device fabrication. It can be used for rapid prototyping, small-scale production runs, and to achieve high yields in mass production. The accuracy and speed of the asset make it an ideal choice for a variety of semiconductor processing needs.