Used KARL SUSS / MICROTEC MA 6 #9375851 for sale

KARL SUSS / MICROTEC MA 6 mask aligner is a sophisticated optical equipment used for precise application of photoresist on semiconductor substrates. It is capable of positioning a reticle onto a photoresist-coated semiconductor with nanometer accuracy and reproducibility. The system works by using mirrors and lenses to project light onto the substrate and create a pattern of light and dark areas. This is detected by a charge-coupled device (CCD) camera and the image is analysed to align the pattern with the substrate. MICROTEC MA6 is designed to be compatible with many substrate materials, such as silicon, gallium arsenide, polycrystalline diamond, as well as quartz and other glass-like materials. It is also equipped with features such as fan-beam illumination for increased working distance, high resolution and high power laser for high precision positioning, and dual-beam exposure for improved pattern matching accuracy. In addition to the essential components, KARL SUSS MA-6 also has a number of other useful features that allow it to be tailored to various applications. These include the capability to detect out-of-focus conditions and auto-correct them, adjustment of mask compensation and image shift, memory storage of mask registration data, and a multi-exposure mode for handling complicated spaces between elements. KARL SUSS / MICROTEC MA6 also has a unique optical breadboard, which helps reduce vibration and allows for alignment of optical elements at the same time. In order to ensure reliable and high-precision alignment, KARL SUSS MA 6 has several software-controlled alignment parameters such as scan size and pattern repeatability. The unit enables four different alignment approaches - parallel processing, grid, shadow and an entire layout. All of these features work together to provide fast, highly accurate and repeatable alignment results. KARL SUSS / MICROTEC MA-6 has a wide range of applications, ranging from micro-electronic to biomedical applications. It is being used in many industries, including photolithography, glass food and beverage bottle decoration, thin-film solar cell processing, machine vision and semiconductor wafer processing. It is also used in the production of various components, such as micro-lenses, lenses and moldings. Overall, MA-6 mask aligner is an ideal tool for precise patterning of photoresist on semiconductor substrates. It is equipped with advanced technology and features which allow it to be adapted to various applications, providing repeatable and accurate results. It is a reliable and highly efficient machine which is used in numerous industries around the world.