Used KARL SUSS / MICROTEC MA 760 #293637680 for sale

KARL SUSS / MICROTEC MA 760 is a computer-controlled, optical projection-based mask aligner designed for plasma etching and photoresist-coated wafer exposure. It is well-suited for both masking and metrology applications and is one of the most advanced automated exposure systems on the market. MICROTEC MA 760 offers superior alignment accuracy and a high degree of automation for exposure-critical lithography processes. It features a laser interferometric stage, dual high-pixel density cameras, a high-speed handling system, and a sophisticated HD processor. The powerful exposure system's opto-mechanical subsystem provides the user with the highest level of accuracy, repeatability, and throughput. KARL SUSS MA 760's high-resolution cameras and 10:1 projection optics enable alignment accuracy better than 2 microns and excellent edge placement performance. It features High Dynamic Range Imaging (HDRi) to improve edge and topography recognition, while two inner line scan cameras detect more detailed edge subtle characteristics beyond a regular photo-mask. MA 760 can process a wide range of substrate sizes and shapes, and is equipped with a secure edge handling system, capable of automatically loading, aligning and exposing substrates without manual intervention. It can also provide excellent through-wafer uniformity over large areas. The user-friendly software offering comprehensive process control and data analysis, along with a comprehensive suite of process monitoring and control algorithms, ensures minimal intervention and ease of use. It also offers automatic data logging and advanced reporting functions, including wafer-by-wafer data traceability and report export. KARL SUSS / MICROTEC MA 760 is reliable, long-lasting and easy to maintain, thanks to its robust construction and stable operation over time. A cleanroom stipulation of Class 1000 makes sure that the equipment only requires a moderate amount of maintenance during its product lifespan. All of these features make this machine a great choice for demanding photolithography applications.