Used KARL SUSS / MICROTEC MA 8 / BA 6 #9262949 for sale

KARL SUSS / MICROTEC MA 8 / BA 6 Mask Aligner is a versatile automatic wafer stepper for mask fabrication. The equipment utilizes a patented optical alignment algorithm and a double CCD alignment system to ensure precise alignment between the wafer and the mask. MICROTEC MA-8 / BA6 features a large field of view and high-quality optics to ensure accurate alignment up to 6 µm. The wafer/mask misalignment, including surface non-flatness, is correctable. It can accommodate 2" to 8" wafers and is able to expose down to the 0.5µm range, making it well-suited for high resolution mask fabrication. The unit also has a motorized XY and Z-axis capability which enables excellent pattern placement accuracy and alignment reproducibility. It also offers diode protection to prevent any damage to the mask or wafer caused by laser alignment. This feature allows the user to accurately adjust the position of the mask before exposure, ensuring superior accuracy and precision in the alignment process. Furthermore, KARL SUSS MA-8 / BA-6 features a compact footprint and is equipped with a powerful automated open loop control machine for superior exposure control and repeatability. Revolutionary exposure parameters such as steam angle or reticle pattern size and real-time monitoring of dose can be adjusted and monitored during exposure. MA 8 / BA 6 boasts low cost of ownership due to its low power consumption and automatic maintenance requirements. The Mask Aligner also features an enhanced user-interface with intuitive graphic menus for fast and trouble-free operation. An embedded high-speed Ethernet port is available to facilitate network connection and allow for remote maintenance and support. This feature facilitates remote operation and maintenance while ensuring a secure real-time connection. Overall, KARL SUSS MA 8 / BA 6 Mask Aligner is a reliable and accurate automatic mask aligner designed for precise and efficient mask fabrication. It offers an excellent combination of performance, features and flexibility, allowing users to deliver high-performance mask alignment with minimal cost and effort.