Used KARL SUSS / MICROTEC MA 8 / BA 8 Gen 2 #9352165 for sale
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ID: 9352165
Wafer Size: 8"
Vintage: 2007
Mask aligner, 8"
Top and backside alignment
Splitfield microscope
UV 400 Exposure optics
Wavelength range: 365-405 nm
Lamp house: 1000 W
CIC1200 Lamp power supply
BSA Chuck
Mask holder
Operations manual
Documentation
Operation modes:
Hard contact
Soft contact
Vacuum contact
Proximity
Ellipsoidal mirror has been replaced
UV Bulb has been replaced
Cold light mirror
Front turning mirror
Front lens
Shutter cylinders has been replaced
Mirror house cylinder has been replaced
Microscope illumination bulbs has been replaced
Microscope assembly
Optical microscope alignment
WEC Head
Pneumatic regulators
Cover
Isolation table:
Air bag
Air line
Wheels
Leveling feet
Power supply: 200-240 V, 50/60 Hz
2007 vintage.
KARL SUSS / MICROTEC MA 8 / BA 8 Gen 2 is a semi-automatic mask aligner used in the photolithographic process. This mask aligner is employed for processing photomasks and wafer substrates to create devices with a high level of accuracy and precision. The Gen 2 has a host of features which enable higher speed, accuracy, and reliability when etching and fabricating semiconductor devices. MICROTEC MA 8 / BA 8 Gen 2 utilizes the latest in optical technology and automated precision alignment for accurate small-scale patterning. The mask aligner is custom configured to meet the needs of the user with features such as an adjustable mask placement field, a stepper motor drive system for mask transport and alignment, and a high precision mask positioning system. Furthermore, its advanced temperature control technology ensures consistent deposition and patterning results. In order to ensure accuracy, KARL SUSS MA 8 / BA 8 GEN2 is capable of sub-micron resolution, with an accuracy of up to +/- 20 nm. Users can configure the aligner to handle a wide range of substrates, including those with an area of up to 8 inches in diameter. Furthermore, the machine features a flexible architecture enabling the user to customize their setup to address a variety of applications and process requirements. KARL SUSS / MICROTEC MA 8 / BA 8 GEN2 is suitable for fabrication of a range of semiconductor devices, such as integrated circuits, transistors, and memory chips. Additionally, its software package allows users to perform comprehensive data logging and analysis, giving users the power to monitor the performance of their machine with ease and confidence. KARL SUSS MA 8 / BA 8 Gen 2 is a reliable, efficient mask aligner designed for increased throughput and accuracy of small-scale photolithography. With its advanced optics and precise alignment capabilities, the Gen 2 ensures high quality results. With its customizable options, it is a perfect industrial tool for any semiconductor fabrication application.
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