Used KARL SUSS / MICROTEC MA 8 Gen 2 #293609268 for sale

KARL SUSS / MICROTEC MA 8 Gen 2 is an automated mask aligner used in the fabrication of semiconductor photomasks. The mask aligner is well-suited for larger mask sizes and offers high resolution and substrate versatility. It is a two-step process that uses a contact exposure and projection printing to precisely align etched patterns with the designed photomask. This is done by a series of carefully calibrated steps which are all fully automated. The equipment is equipped with a precision-aligned scanning head assembly and advanced software control. The scanning head acquires the substrate details (e.g. trench width, curvature, focus, etc.) through the embedded sensors and the algorithms which are programmed into the control unit. Subsequently, the scanning head translates the intended position of the photomask onto the substrate through the laser and optics system. This provides resolution and accuracy that is much higher than traditional contact-exposure systems. MICROTEC MA 8 Gen 2 has five substrate bed sizes: 4", 5", 6", 8", and 12". It has a projection printing area that ranges from 75 µm to 300 µm, with resolution of up to 3 mm. The unit offers multiple wafer plate designs and sizes, which allow the user to accommodate multiple substrate types. KARL SUSS MA 8 / GEN 2 has many features beyond those related to mask aligners. It is designed with health and safety in mind and its open architecture can be easily integrated into other automated systems. It is also built to maximize reliability and performance, with its automatic cleaning and calibration cycles. Its easy-to-follow commands and locking mechanisms aid in the efficient transfer of masks throughout the machine. Additionally, MA 8 / GEN 2 is compatible with both Windows and Linux systems, allowing for easy integration into existing product or test environments. KARL SUSS MA 8 Gen 2 is an ideal choice for contacting and photomask production. Its high resolution, substrate variability, and automation provide efficient, effective, and accurate mask processing. Its open architecture and compatibility with existing systems make it a great choice for many semiconductor device fabrication scenarios.