Used KARL SUSS / MICROTEC MA 8 Gen II #293654629 for sale

KARL SUSS / MICROTEC MA 8 Gen II is a mask aligner specifically designed for advanced nanofabrication processes. This advanced instrument uses a combination of laser positioning and optical microscopy to accurately transfer various lithographic patterns onto thin film samples for a wide range of applications including semiconductor device processing. MICROTEC MA 8 Gen II features an Opto Thermo Model laser pattern generator, which allows precise pattern reproduction through a simple, intuitive interface. Additionally, KARL SUSS MA 8 Gen II has been developed for use with various substrates and tools including chrome and quartz mask materials, and allows for a high level of flexibility and accuracy in the process of fabrication. MA 8 Gen II also features an intuitive visual interface, which allows for easy alignment of the masks and patterns quickly and accurately without difficult calculations or convergence algorithms. This equipment also features a high-resolution imaging mode for identifying and verifying alignment and registration accuracy, and a vacuum chuck system with a range of sample stages for varied mask formats and size. The mask aligner is also equipped with a large stage area, allowing for efficient alignment time, as well as a mechanical pulley unit which allows for easy adjustment of the rotation angle of the mask. Furthermore, KARL SUSS / MICROTEC MA 8 Gen II is temperature controlled to maintain control of the mask during the alignment process, and contains features such as flexible mask plates and an option for wafer holders. The mask aligner uses high powered LED lighting to ensure precise pattern resolution, and is designed to be used with various applications such as video projection aerospray, thermal transcription and vacuum baking. It is compatible with a wide range of substrates from a variety of industries such as Medical device, Aerospace, and Automotive. MICROTEC MA 8 Gen II is an extremely versatile and flexible mask aligner which is well suited for a variety of advanced nanofabrication processes. This advanced machine can be used to fabricate very precise patterns and offers a high performance level of accuracy and flexibility. This tool can be used on a wide variety of samples with a wide range of features and capabilities, making it an ideal choice for any advanced nanofabrication process.