Used KARL SUSS / MICROTEC MA 8 #293587271 for sale

KARL SUSS / MICROTEC MA 8 is a fully automated photolithographic mask aligner for the production of integrated circuits in the submicron range. It is a high precision, modular machine that supports a range of oblique and diagonal aligners, UBM and Aspheric mirrors, and a wide range of stage automation levels to fit different process requirements. This includes both batch and single wafer processing, as well as high-resolution measurement of sample structures. The main components in MICROTEC MA8 include the X-Y stage, the wafer chucks, the sample holder, and the reticle chuck. The X-Y stage enables sample movement for precise alignment using two precision devices, which provide a sub-micron resolution. The wafer chucks hold thin samples up to 3 mm thick, and the sample holder positions them relative to the microscope. It is held in position under the microscope, and a microprocessor controls the wafer's movements through a series of programmed sequences. The reticle chuck holds the exposed masks in position over the wafer, and its movement is also controlled by the microprocessor. Other features of KARL SUSS MA-8 include an advanced focus servo system, which provides stepper motor alignment, as well as automated edge detection to identify sample size and shape. Precision alignment enables the sample to be accurately placed, and a high-frequency XY linear stage is used for very fine alignment and positioning. The system also features a vacuum sensor, which is used to control the exposure process. For maximum productivity, MICROTEC MA 8 offers a pneumatic speed control, and automatic dot/spanning of photosensitive materials for UBM alignment. The machine also features multiple exposure sources including various powers of arc lamps, X-ray sources and lasers. This allows for the full automation of production processes and ensures that chips are reliably aligned and exposed. In conclusion, MA8 is a versatile, high-precision mask aligner that is the perfect solution for circuit production in the submicron range. Its modular design and a range of automated features enable accurate one or multiple layer exposure, with high precision focus and alignment. With its many advantages, this machine can provide the highest quality and productivity circle production.