Used KARL SUSS / MICROTEC MA / BA 6 #293826496 for sale
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ID: 293826496
Wafer Size: 4"
Mask aligner, 4"
Top Side Alignment (TSA)
Bottom Side Alignment (BSA)
Color: Orange/Tan.
KARL SUSS / MICROTEC MA / BA 6 is a fully automated wafer stepper/mask aligner used for aligning thin patterned foils (masks) to the substrate. MICROTEC MA / BA 6 is often used in the microelectronics industry and research organizations for fabrication purposes. The wafer stepper/mask aligner features a 'beam' design, which comprises two independent 6-axis control elements with galvanometers and controllers. The galvanometers control the scanning of the planar surface of the substrate. The controller holds precise coordinate systems in all three dimensions with high positional accuracy. KARL SUSS MA / BA 6 is capable of handling wafers up to 8" (200mm) in diameter. It has a full range of mask sizes, from 6"(152mm) up to 8"(200mm). The exposure field size of MA / BA 6 is a minimum of 5.5μm × 5.5 μm up to a maximum of 8μm × 8μm. The stepper is designed with an index equipment that allows for precise repeatability and accuracy. This is achieved through a 'four-point scoring address', which comprises four holes evenly spaced on the edge of the mask (or chromeless reticle) that the index system recognizes. KARL SUSS / MICROTEC MA / BA 6 has several optional features, like a foam adjustment unit, which gives users the ability to set a specific tension for the mask or reticle being installed on the machine. The wafer stepper also features a manually operated load lock, which can be used to load a single or multiple substrates and allow them to cool before the exposure / alignment process. MICROTEC MA / BA 6 also includes a tandem vision tool, which uses multiple cameras to capture the images of the alignment targets for comparison. Some of KARL SUSS MA / BA 6's more advanced features include: the capability to program several tasks to run in succession, a high-resolution R2R mask plate reader, and a powerful pattern matching algorithm. For tasks that require a higher level of accuracy, MA / BA 6 can be equipped with an optional deflector, which allows for the adjustment of the exposure beam an extra-fine level. KARL SUSS / MICROTEC MA / BA 6 also has a wide range of compatible accessories that enable users to further customize the asset. Overall, MICROTEC MA / BA 6 is an advanced, automated wafer stepper/mask aligner that helps to optimize the accuracy and repeatability of the alignment and exposure process. Its features and compatible accessories enable users to customize the model to meet their specific fabrication needs.
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