Used KARL SUSS / MICROTEC MA200 GEN3 #293816212 for sale
URL successfully copied!
KARL SUSS / MICROTEC MA200 GEN3 is a next-generation mask aligner designed for advanced patterning and metrology applications across the semiconductor and MEMS industries. The system features a self-contained design that is compatible with optical stepper systems, providing for precise and efficient alignment of photomasks, engineering drawings, and wafers. The machine is highly configurable, allowing for custom solutions that meet the unique needs of each individual user. MICROTEC MA200 GEN3 is designed for automated wafer processing. The machine is capable of patterning various substrates, including photoresist, glass, and metals, enabling a wide range of device fabrication and testing methods. It features a long-life, direct-drive stepping motor and positionable stage, providing for accurate parts tracking, alignment, and placement. In addition, the machine is designed with an array of integrated components, such as photo-imaged masks, wafer stages, and a high-power UV light source, for integrated exposure and thermal processing. KARL SUSS MA200 GEN3 also provides high-accuracy metrology capabilities. Its patterned wafer stage features imaging software for evaluation of lithography performance, while its high-resolution camera and microscope enable high-resolution inspection. It also has software-controlled focusing and zooming options for precision evaluation and analysis. Additionally, it is equipped with a variety of test and inspect functions, ranging from manual and automated inspections to advanced automated metrology techniques. The machine is available with various options, including a vacuum chuck for repeatable wafer placement, an automated stage inspection option, and a double-sided exposure option. It is also available with a range of accessories, including robotic arm loaders, cassettes, and substrate carriers. The machine's integrated software package provides a user-friendly interface and allows for data logging and analysis, enabling efficient jobsite scheduling and management. MA200 GEN3 is the ideal choice for advanced mask aligning and metrology needs. It is designed to provide a highly efficient and precise processing environment for a wide range of industrial and fabrication applications. With its robust performance and highly configurable nature, KARL SUSS / MICROTEC MA200 GEN3 offers an unmatched combination of performance and precision.
There are no reviews yet