Used KARL SUSS / MICROTEC MA200 GEN3 #293829722 for sale

KARL SUSS / MICROTEC MA200 GEN3 is an automated, high-precision Mask Aligner specifically designed for high-tech photolithography processes. This tool is used for creating photomasks for accurate patterning of photomaterials such as thin-film coatings, resists and inks. MICROTEC MA200 GEN3 is capable of producing patterns with feature sizes as small as 0.5μm, with sub-micron accuracy and repeatability. The equipment also offers high spatial resolution and very low exposure dose variation. KARL SUSS MA200 GEN3 is equipped with scanning XY stages, a microscope, an alignment system, an exposure unit, and a range of other controlling and monitoring features. The motion stages are capable of accurate, repeatable motions in X,Y, Theta and Do me axes, allowing sub-micron positioning of the entire exposure unit with nanometer precision. The exposure unit uses a variable rate scan machine to vary the heat of exposure according to the required pattern density over the entire area of exposure. The alignment tool includes a high-precision imaging asset that enables auto-alignment of macro-, micro- and nano-patterns with high resolution and accuracy. The microscope allows direct control and observation of the exposure and alignment process. Alignment measures include a variety of options such as edge ridge alignment, point-to-point registration and registration based on a predefined reference pin. A built-in software-based method also allows for real-time optimization of alignment accuracy. For controlling all subsystems MA200 GEN3 is equipped with a digital motion controller, a temperature control model, an exposure controller and digital image processing systems. These subsystems monitor and control all equipment components and integrate different control parameters in order to ensure consistent output quality. KARL SUSS / MICROTEC MA200 GEN3 is the most advanced mask aligner available in the market. It offers efficient and precise patterning of photomaterials and complex masks up to 5x5 cm². With its high resolution, accuracy and repeatability, MICROTEC MA200 GEN3 is the perfect choice for production of electronic circuits, opto-electronic devices, displays and other precise patterning applications.