Used KARL SUSS / MICROTEC MJB-21 #9140521 for sale

KARL SUSS / MICROTEC MJB-21 is a high-precision mask aligner that is used primarily for photolithography processing. It has been designed to provide a clean, safe, and reliable environment for the precise fabrication of sub-micron semiconductor devices and components. MICROTEC MJB-21 has a heated stage of 150 mm x 190 mm and allows the movement of a 4" substrate. It has a uniform exposure over 1 x 1" areas with a maximum alignment spot placement of 5 micron on a 4" wafer. In addition, KARL SUSS MJB 21 has an alignment monitor with image processing for realizing accurate alignment and bonding of device structures. KARL SUSS / MICROTEC MJB 21 features two independent, programmable 400 watt mercury arc lamps with a pressure controlled uniform exposure area of 1 x 1". The lamps are capable of independently varying exposure times from 10 seconds to 250 seconds with 11 mJ per cm2 maximum output. This allows for the flexibility required for processing a wide variety of materials. MICROTEC MJB 21 provides users with fast, accurate and repeatable alignment using collimated microscopy and utilizes manual or automatic alignment of substrates relative to the mask. MJB-21 mask aligner contains a heating element in the stage that can be set from room temperature up to 100 degrees Celsius with adjustable humidity that can be tailored for each application. The stage also features a precision positioning and vacuum chucking equipment that enables accurate substrate placement and fine steps of 0.5 micron. KARL SUSS MJB-21 includes a remote diagnostics and maintenance interface that simplifies setup and improves overall reliability. MJB 21 also utilizes an advanced vacuum system to minimize the movement of air during the alignment process. This ensures accurate alignment with repeatable results and reduces contamination of the device. KARL SUSS / MICROTEC MJB-21 has a dual lift-off unit which automatically processes two masks simultaneously and a centering machine that accurately positions both masks. This allows for a more efficient and accurate processing of devices even with complex layouts. MICROTEC MJB-21 is a high-precision mask aligner that is designed to provide users with the most advanced and accurate photolithography processing available. It offers a uniformly exposed area of 1x1", with a maximum alignment spot placement of 5 micron on a 4" wafer. It features two independent, programmable 400 watt mercury arc lamps, a pressure controlled uniform exposure area of 1 x 1", a remote diagnostics and maintenance interface, an advanced vacuum tool, and a dual lift-off asset which allows for simultaneous processing of two masks. All of these features make KARL SUSS MJB 21 an ideal tool for efficient and accurate photolithography processing.