Used KARL SUSS / MICROTEC MJB-3 #114445 for sale

KARL SUSS / MICROTEC MJB-3 is a mask aligner developed for use in semiconductor manufacturing processes. It is a high precision alignment equipment that uses a unique high-resolution optical imaging technology to ensure accuracy and repeatability. The system is designed to image and align two or three individual photomasks to predefined patterns on a wafer for manufacturing of advanced semiconductors. MICROTEC MJB3 utilizes a unique combination of robotics, optics, and software to accurately align pre-defined photomasks to a wafer. It features an integrated stand-alone personal computer with a proprietary graphics user interface (GUI) and control program to enable users to conveniently setup, align, and monitor their alignments. It is also equipped with several standard user-defined alignment parameters such as target position, image quality, and alignment speed selection. KARL SUSS MJB 3 is designed to easily configure and handles up to three masks at once. It uses a single beam per mask chucked in a full-field projection unit that features excellent thermal performance, fundamental imaging aberrations, and high accuracy in alignment. Additionally, the microscope allows for the scanning of wafers with accurately aligned sub-pixel positions. The increase resolution is beneficial for the alignment of masks within a field of view as small as 5µm. KARL SUSS MJB 3 is an automated machine that is equipped with a high-speed robotic arm, enclosed chambers, digital encoder and bearing slides, sophisticated software, and an impressive array of digital detectors to perform the alignment quickly and precisely. It also offers a highly repeatable and accurate alignment performance. The aligner also supports a variety of photomasks ranging from thin film photomasks to large step-and-repeat patterns. In summary, KARL SUSS MJB-3 is a powerful and user-friendly mask aligner that is suitable for the manufacture of advanced semiconductor devices. It offers high accuracy, precision and repeatability for the alignment of photomasks to a wafer within a small field of view. It is an automated tool that is perfect for high-volume manufacture of semiconductor wafers and is installed in a variety of production sites.