Used KARL SUSS / MICROTEC MJB-3 #293649571 for sale

KARL SUSS / MICROTEC MJB-3 is an automated photolithography mask aligner manufactured by MICROTEC, located in Germany. It is used by semiconductor and microelectronics industries for fast microfabrication, such as photolithography, of complex components. MICROTEC MJB3 is able to accurately pattern down to the nanometer range, with 1 μm resolution accuracy. Through the use of its four-axis gimbal-mounted stage, it is faster and much more efficient than other mask aligner methods. This gimbal-mounted stage enables excellent stability and accuracy of the x-axis, y-axis and z-axis movements. KARL SUSS MJB 3 also utilizes dual alignment techniques, providing high throughput and superior accuracy. To position the mask, MICROTEC MJB-3 uses a four-state auto-focusing equipment. This system is able to locate and precisely locate the mask in all three axes, with 1 μm resolution accuracy. It can also detect the position of the alignment marks on the mask, allowing for precise and well-aligned masks. The alignment marks on the mask are detected by a CCD camera which is attached to a monitor, allowing the operator to guide and monitor the alignment process. KARL SUSS / MICROTEC MJB3 uses a choice of UV, i-line and deep-UV light sources. This allows for a variety of lithographic processes including topographic overlay, backlighter, contact and other processes. The combinations of the different light sources and the alignment techniques available, give KARL SUSS / MICROTEC MJB 3 the ability to provide flexible and efficient photolithography solutions. To protect the user from exposure to radiation, there are multiple safety systems included in MJB 3. These include a customisable interlocks unit which monitors the location of the operator; a photostabilizing shield which filters out UV wavelengths; and a safety machine which monitors the level of UV supplied. In conclusion, MJB-3 is an automated photolithography mask aligner which provides the industry with a high throughput and accurate method of photolithography. The combination of the choice of light sources and the four-axis gimbal-mounted stage allows KARL SUSS / MICROTEC MJB 3 to pattern down to the nanometer range, reaching an accuracy of 1 μm. Furthermore, it is also capable of providing excellent safety systems which protect the user from exposure to radiation.