Used KARL SUSS / MICROTEC MJB-3 #293713185 for sale

KARL SUSS / MICROTEC MJB-3 Mask Aligner is a precise and reliable lithography equipment used for direct photolithographic processing, for example, in the fabrication of microelectronic circuitry and thin film deposition. MICROTEC MJB3 system provides easy alignment and operation, featuring programmable coordinates, camera feedback and open architecture accessibility. Its five-axis positioning unit guarantees superior alignment stability and accuracy, which can be set to an absolute precision of 0.5 µm. The aligner is equipped with a large 715 x 715 mm exposure stage, as well as a 5-m long track that assists in translation and a high-accuracy reticle clamp. In addition, KARL SUSS MJB 3 showcases an ergonomic design that allows for easy operation and comfort for the user. The machine is powered by the RoboticVision software, which ensures consistent performance and accuracy when used for critical alignment and overlay tasks. MJB-3 is ideal for many applications, such as wafer-level packaging, die attach, thin film processing, and MEMS fabrication processes. It can accommodate a wide variety of substrates, ranging from wafers to flexible substrates, and can be used with all resists, including positive and negative resist formulations. This versatility makes it very attractive for integration into multi-step systems. For exposure, MICROTEC MJB 3 can be used in combination with a range of light sources, including excimer and far-UV exposure sources. The exposure block, located at the front of the instrument, is highly customizable, featuring a sliding exposure arm, enabling manual alignment and controlled exposure short and long exposure times. For user convenience, the operating software includes advanced analysis tools, such as auto-alignment calibration and automatic exposure mode selection. Furthermore, the operator can monitor and control the tool through a robust user interface or via the Intranet network. This asset is a great choice for anyone looking to reliably and accurately fabricate microelectronic devices. Its large stage, high precision and programmable control, makes it a state-of-the-art option for modern mask aligner applications.