Used KARL SUSS / MICROTEC MJB-3 #293743798 for sale

KARL SUSS / MICROTEC MJB-3 mask aligner is a precision opto-mechanical machine designed for photolithographic processing. It is primarily used by the microelectronics and semiconductor industries to fabricate submicron-resolution devices and circuits. MICROTEC MJB3 utilizes a continuous-wave laser source, along with a projection and imaging equipment, to transfer patterns from a hard photomask to a wafer-surface substrate. The system is equipped with two sacrificial stages, which provide a stable, level positioning unit for careful alignment of the mask and substrate. This alignment is aided by a highly precise, automated X-Y raster scanning machine and a Z-axis depth control with real-time feedback and a resolution of 1.3 nanometers. KARL SUSS MJB 3 has an illumination lens with a numerical aperture (NA) of 0.55 that is able to illuminate 2" or 4" or 6" or 8" or even 10" masks, depending on the configuration. In addition, MICROTEC MJB-3 is designed and engineered to provide reliable operation and high resolution repeatability, with minimal setup time needed. It is equipped with an adjustable vacuum clamp that provides an adjustable support for the wafer. MJB-3 also uses a line and edge compensator for precise alignment of the edge profile. This compensator is composed of a set of distance elements and a drive unit, which allows for fine shore control. In terms of safety and control, KARL SUSS MJB 3 is equipped with two self-interlock mechanisms. The first is an electromagnetic interlock that prevents the tool from operating when the chamber and autofocus plate are opened. The second is a key-operated interlock that prevents unauthorized personnel from operating the asset. MJB 3 is a powerful and precise tool for photolithographic processing. Its modular design and precise control model make it an efficient and reliable device for fast and accurate results, even with challenging masks and substrates. Furthermore, its self-interlock mechanisms ensure safe and secure operation, as well as a dependable platform for precision photolithography.