Used KARL SUSS / MICROTEC MJB-3 #293751566 for sale

KARL SUSS / MICROTEC MJB-3 is a fully-automated capable mask aligner used in the semiconductor industry for photomask generation and wafer exposure processes. Its main function is to accurately position and align a photomask (containing patterns) on the wafer surface to be used in the exposure process. It is designed to provide quick and repeatable mask alignment operations with excellent positioning accuracy. MICROTEC MJB3 features two independent linear stages. These X and Y stages are both driven with direct-drive motors that provide a very precise, high-resolution (with an accuracy of up to 1 micron) and repeatable alignment capability. It also has lasers which are used to measure the alignment of the mask to the wafer to sub-micron accuracy. The mask and wafer can be moved independently and precisely on the X and Y linear stages. In addition, KARL SUSS MJB 3 also utilizes a wafer handler and a mask handler control, to enable easy handling of the optics. Both have unique alignment systems, wherein the mask handler has lenses that help ensure the alignment accuracy of the mask pattern, and the wafer handler has its own independent centering system. It is also equipped with vision systems which help in locating and manipulating the wafer and mask. KARL SUSS / MICROTEC MJB 3 mask aligner includes a programmable logic controller (PLC) that can facilitate the automation and processing of exposure programs. It also features a process monitor that provides easy access to exposure parameters and data. It also allows storing of multiple mask and wafer positions, as well as exposure parameters. KARL SUSS / MICROTEC MJB 3 is reliable and easy to use, and its repeatable mask alignment and accuracy makes it a preferred tool for photomask generation and wafer exposure processes. It is capable of handling various types of photomasks, and its components can be customized to suit different wafer exposure applications. Its robust design ensures that it meets the highest quality standards, making it the ideal mask aligner for any photomask generation or wafer exposure process.