Used KARL SUSS / MICROTEC MJB-3 #293795170 for sale

KARL SUSS / MICROTEC MJB-3 mask aligner is a device used to accurately align and align a mask over a wafer. MICROTEC MJB3 utilizes a 3-axis stage that is capable of moving the mask in the horizontal, vertical, and depth direction. It also features two independently adjustable, stepper motor-driven stages, for accurate focus positioning of the mask over the wafer. The microscope features resolution of 0.1 µm in the X-Y direction and 0.05 µm in the Z-axis. KARL SUSS MJB 3 has been specifically designed for photolithography, making one of the most comprehensive mask aligners available today. This mask alinger is well-suited to create masks of different shapes and sizes with excellent particle-level results. It has a field of view of 12 mm x 12 mm, with resolution of 0.1 µm in the X-Y direction and 0.05 µm in the Z-axis. It has the ability to easily expand its field of view, making it well-suited for creating complex patterns with tight geometries. KARL SUSS / MICROTEC MJB 3 features fine-focus adjustment under the microscope with accuracy and repeatability up to 1.0 µm or better. This ability to adjust the focus makes it well-suited for creating high-precision masks with small geometric features, as well as for light-sensitive substrates. It can also be used to create line widths of up to 0.5 µm with high precision. In addition, MJB-3 offers a variety of useful features, including an integrated Wafer Sense control to accurately align the mask with the wafer, a data storage and analysis feature for easy reference when designing masks, and an adjustable mask-frame size of up to 126 mm. It also includes an integrated positioning system, collimation carrier, illumination and safety system, a frequency generator and optical filters, and a variety of different light sources. Overall, MICROTEC MJB 3 mask aligner is a versatile, high-precision device designed for photolithography and mask alignment. With its three-axis stage, fine-focus adjustment, and wide array of features, MICROTEC MJB 3 ensures accurate alignment and repeatable results when creating masks of different shapes and sizes. It is ideal for creating complex patterns with high accuracy, as well as for creating light-sensitive substrates and line widths of up to 0.5 µm.