Used KARL SUSS / MICROTEC MJB-3 #293797042 for sale

KARL SUSS / MICROTEC MJB-3 Mask Aligner is a full-capacity alignment and exposure equipment specifically designed for high-resolution contact lithography on 4 and 6 inch substrates. With an in-situ focus monitor, high-speed autofocus, integrated motorized Z-stage and highly accurate wafer alignment, MICROTEC MJB3 offers unparalleled precision when producing fine microstructures. The optics are also extremely robust, providing excellent linearity, high contrast, and sharp image. To control the system accurately, KARL SUSS MJB 3 is equipped with an optimized numerical-optical control unit for repeatable high-precision alignment, focusing, exposure and stage steps. The machine can be easily interfaced with MICROTEC MJB 3's intuitive software, developed to simplify complex lithographic processes. It offers user-friendly settings for driving parameters, object size selection and machine configuration, allowing users to create reliable processes quickly and with ease. The software also provides comprehensive logging of settings and results for detailed tool performance analysis. To optimize the exposure for every application, the asset includes a wide range of illumination settings and a variable numerical aperture. The variable numerical aperture ensures that the required resolution is achieved depending on the structures size and resolution requirements. The reflection and absorption optimized optics also allow the user to vary the aspect ratio up to 8 inches. This ensures the highest possible resolution by optimizing the design aspect ratio to be matched to the mask. For wafer loading and unloading, MJB 3 Model offers either manual handling or an integrated cassette loader with an adjustable holder to accommodate up to 12 wafers. The cassette loader provides a control temperature condition as low as 10°C. Furthermore, the tilt and rotation functions can be used to adjust the orientation of the wafer for each shot. Overall, MJB-3 Mask Aligner offers precise lithographic patterns with repeatable accuracy and high resolution. Its precise optics, advanced software, optimized alignment and exposure settings, and improved loading and unloading equipment make it the ideal choice for contact lithographic processes in the industry.