Used KARL SUSS / MICROTEC MJB-3 #293830941 for sale

KARL SUSS / MICROTEC MJB-3
ID: 293830941
Contact aligner systems.
KARL SUSS / MICROTEC MJB-3 is a versatile and reliable mask aligner, ideal for photolithography stenciling applications. It is an advanced equipment for large-scale fabrication of patterned devices such as MEMS, RF, optics, and various other devices. MICROTEC MJB3 offers high-throughput and cost-effective production and is compatible with any type of substrate. The system is composed of three main components, consisting of the optical main unit, the main console, and the vacuum unit. The optical main unit houses the optical components and contains an enclosed enclose chamber for alignment. The main console includes the power, safety, shutter and external component controls. The vacuum unit provides the necessary vacuum pressure for substrate manipulations and film alignment. KARL SUSS MJB 3 features a wide range of features, such as a three-step alignment unit based on a laser, autofocus alignment, and variable-step autofocus. It also has the capability of adjusting film position in the X, Y, and Z axes. The LEDs that are housed in the laser housing also provide a visual reference of the patterns. In addition, KARL SUSS MJB-3 has an integrated film to substrate mapping machine allowing for repeatable alignment and reliable overlay accuracy. The tool also utilizes a high-precision, digitally controlled actuating asset for precise pattern placement. It also offers a variety of patterning options such as exposing from rolled or board materials, moving from one frame to the next frame, or exposing a single frame. KARL SUSS MJB 3 has a wide range of applications, due to its robust construction and enabling components. It is used for PCBs and devices such as RF, MEMS, microfluidic chips, and optical components. Moreover, the unit can be integrated into production lines, which provides it with greater efficiency. Overall, MICROTEC MJB 3 is the ideal model for any photolithography stenciling application. With its robust construction, optimal patterning accuracy, and integrated film-to-substrate mapping equipment, this mask aligner is capable of reliably handling large-scale production applications.
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