Used KARL SUSS / MICROTEC MJB-3 #76306 for sale

KARL SUSS / MICROTEC MJB-3 is a mask aligner, also known as a stepper, used to create semiconductor devices. It is a lithography tool that is well suited for creating a variety of components such as transistors, diodes, resistors, memory cells, and capacitors. MICROTEC MJB3 operates by projecting a pattern of light, or mask, onto the surface of a semiconductor material. The mask aligner then uses a pair of precision-controlled x-and y- movable stages to precisely align the pattern over the semiconductor wafer. This is done by a computer-controlled stepping mechanism that synchronizes the x-and y-axis motion of the mask and the semiconductor wafer. Additionally, KARL SUSS MJB 3 has an optical alignment equipment, which helps to ensure that the pattern is accurately placed. MJB-3 utilizes a state-of-the-art microlithography technique known as deep reactive ion etching (DRIE). This technique uses a combination of reactive ion beam etching and deep ultraviolet lithography to accurately etch patterns into the surface of a semiconductor wafer with a high degree of precision. KARL SUSS MJB3 also features an advanced optical alignment system. This ensures that the mask is accurately placed over the semiconductor wafer, even down to the nanometer scale. Additionally, this alignment unit also helps to reduce any distortion that might occur during the etching process. In addition, KARL SUSS / MICROTEC MJB 3 utilizes a number of safety features. These help to ensure that the tool is operated in a safe manner, protecting both the operator and the wafer from potential damage. Other features include an anti-contamination machine, which helps to prevent dust and particles from contaminating the equipment and the semiconductor wafers. Overall, KARL SUSS / MICROTEC MJB 3 is an advanced and highly efficient mask aligner that is well suited for producing a variety of different components for use in semiconductor devices. Its combination of computer-controlled precision motion, optical alignment, and advanced DRIE microlithography make it an invaluable tool for producing high-quality semiconductor components.