Used KARL SUSS / MICROTEC MJB-3 #9174100 for sale

ID: 9174100
Mask aligner Type: 100UV030 Mimir 505 Optical energy controller included USH-350DP UV Lamp Illuminates: UV Lamp Microscope lamp (3) Objective lenses: NPL 5x / 0.09 ∞ / - / 39 NPL 10x / 0.20 ∞ / - HP 20x / 0.30 DF ∞ / 0 Damaged part: Microscope manipulator.
KARL SUSS / MICROTEC MJB-3 mask aligner is a piece of semiconductor equipment that is used to contact align resist layers in the fabrication of integrated circuits. This mask aligner is capable of both optical and thermal contact alignments, allowing it to be used for many different types of devices such as analog circuits, standard/low voltage digital circuits, thin film transistors and metal-insulator-metal diodes. MICROTEC MJB3 features a high-precision optical equipment which uses a patented Apodizer optical system to allow for precise alignment of up to sixteen contact ports per mask. This unit ensures that each die's contacts line up perfectly with that of the next, eliminating the need for extensive touch ups between different layers of the integrated circuit. KARL SUSS MJB 3 is capable of resolutions as fine as 2.5μm for linearization patterns, and 1μm for contact openings, making it perfectly suited for any kind of intricate semiconductor work. MJB 3 provides users with a large number of programming options to ensure accuracy and speed. Multiple wafer baths can be used concurrent with the machine for maintain cleanliness, as well as improved batch yields and shorter cycle times. Additionally, MICROTEC MJB 3 can be finely tuned to account for environmental constraints, allowing for precise alignments without running up excessive inaccuracies due to thermal or pressure changes. KARL SUSS MJB-3 can also enable more advanced and complicated fabrication processes. Through its dual stage heating tool, it is capable of driven reflow and even electroplating on sacrificial layers such as gold and copper, allowing for extremely intricate and advanced structure design. KARL SUSS MJB 3 is a user-friendly device, allowing for easy operation and maintenance, coupled with high-end performance and precision. Its advanced multi-mode alignment systems, reliable wafer handling, and enormous programming options make it one of the most efficient and versatile photolithography systems available on the market.
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