Used KARL SUSS / MICROTEC MJB-3 #9211064 for sale

KARL SUSS / MICROTEC MJB-3 mask aligner is a precise and reliable mask alignment equipment used in many photolithography applications, including photomask inspection and exposure. This aligner is specifically designed for high-resolution exposure applications, making it ideal for creating ultra-fine features on wafers. It features a step-and-repeat spindle that can align the photomask to the substrate within ±1 micron accuracy, this positioning is done through precise motor-driven single-axis and multiple-axis movement. It also features a large field of view, to accommodate larger substrates and wafers. MICROTEC MJB3 features an improved optics systems that enables users to switch between long working range, high-resolution and long working range with low-resolution imaging modes. The low-resolution imaging mode allows users to confirm alignment and select the best exposure dose by detecting variations in the photomask due to their transparency and reflectivity. The high-resolution imaging mode enables precise inspection and precise location to achieve repeatable and reliable performance over extended lifetimes. Additionally, KARL SUSS MJB 3 incorporates an automated wafer handling system. This unit provides precise positioning and temporary anchoring to the substrate during exposure. The machine also enables users to set the exposure dose to 100 imaging spots per megapixel and uniformity to ±1%. Moreover, this state-of-the-art tool is also equipped with a laser micrometer, which enables precise non-contact scanning of the photomask. Overall, KARL SUSS MJB3 mask aligner is an efficient and precise asset that provides reliable performance for photolithography operations. The combination of imaging, positioning, and automated wafer handling systems allows for a wide variety of applications with accuracy and repeatability. This model also reduces downtime, increases productivity, and broadcasts smaller features with fewer errors.