Used KARL SUSS / MICROTEC MJB-3 #9248455 for sale

KARL SUSS / MICROTEC MJB-3 is an optical mask aligner designed for precise, large-scale alignment of various materials. It is often used for applications ranging from photolithography to micro-machining, as well as for creating patterned substrates. This highly accurate device utilizes a sophisticated optical equipment, an automatic focus control, and a variable pressure manual alignment. MICROTEC MJB3 features two main parts: a mask bot, which mounting plates hold and precisely move the masks over the substrate, and a micromanipulator, which uses the mask bot to accurately position the substrate. The mask bot includes precise XYZ motors that move two stages: one for mask alignment and the other for substrate alignment. The relative alignment accuracy of KARL SUSS MJB 3 is 0.2 µm. In addition, KARL SUSS / MICROTEC MJB3 is capable of high resolution, single-layer alignment down to 1.2 µm. It also offers a choice between single- and double-mask alignment, resolutions of up to 25.4 µm, and a choice between 4, 8, or 12-inch masks. To ensure precise alignment, KARL SUSS MJB3 features a state-of-the-art laser-based alignment system in the micromanipulator. This unit includes single-wavelength and two-wavelength (red/green) options. Its two-wavelength machine allows for greater accuracy in mask-positioning, while its single-wavelength tool works best with green film masks. MICROTEC MJB 3 also incorporates a sophisticated method for measuring mask alignment accuracy. It uses special contact measurements that include measuring the difference between the edge of the film mask and the edge of the substrate to an accuracy of 0.1 µm. This device also features a vacuum chuck, which provides a reliable hold of the substrate during alignment. This chuck serves to protect the substrate from jerk motions. Furthermore, a selectable pressure control option is available for substrates that require higher clamping forces. In short, MICROTEC MJB 3 is a high-accuracy, large-scale mask aligner designed for a variety of applications. It offers reliable alignment precision, automated focus control, variable pressure manual alignment, and multiple mask configurations. This device is ideal for mass production of photolithography and micro-machining, as well as for creating patterned substrates.