Used KARL SUSS / MICROTEC MJB-3 #9248457 for sale

KARL SUSS / MICROTEC MJB-3 is a mask aligner, a type of semiconductor metrology equipment used in the fabrication of integrated circuits. MICROTEC MJB3 is equipped with a special chamber that enables users to fabricate intricate designs on both standard and advanced wafers with submicron precision. This is accomplished by exposing a wafer's surface to focused light from lasers in order to transfer a pattern from a mask that contains the circuit design onto a wafer. KARL SUSS MJB 3 is capable of providing high throughput and yields due to its advanced mask aligner technology along with its low-cost, high-efficiency optical components. This equipment is equipped with four-axis Object-Lens-Stage, mirror-assisted optical alignment which enables precise stepper alignment for maximum throughput. On top of that, its 'dual-lens' optical equipment compensates for the fact that individual masks may have slightly different resolutions than the targeted resolution from the design. To reduce manufacturing costs and defects, KARL SUSS MJB-3 incorporates optical system defocus adjustment and a variety of advanced magnification and illumination parameters. Its 7-inch stepper lens also reduces focusing errors and ensures that the entire circuit design is uniformly exposed to its precise laser light source. MICROTEC MJB 3 also utilizes a convection-cooled mask holder that reduces thermal warp of the mask which can cause blurriness or misalignment of the design. MJB 3 is constructed using a heavy-duty, sealed aluminum housing that ensures the unit is vibration-proof and can be easily relocated. This is important for efficient wafer manufacturing because different wafers may require different orientations. Further, this equipment is equipped with video monitoring, a direct alarm machine and an illuminated reticle providing consistent results every time. MJB-3 is an ideal mask aligner for a variety of applications such as Thin Film and Large Area wafer processing. This equipment is compatible with most wafer designs, polarizers and photomask materials, making it a versatile and reliable solution for all semiconductor manufacturing applications.