Used KARL SUSS / MICROTEC MJB-3 #9257920 for sale

KARL SUSS / MICROTEC MJB-3 is a mask aligner that is used for direct-write electron beam lithography. It consists of an electron gun, an alignment stage, a wafer stage and a column. The electron gun emits a focused electron beam which is precise enough to produce lines and shapes as small as 10 nanometers. The alignment stage holds the selected reticle in place with a precise and repeatable position relative to the wafer. The stage can be optimized to follow the electron beam structure accurately and precisely, allowing repeatable exposures. A reference lens can be added to the alignment stage to allow focus and magnification of the electron beam onto the wafer. The wafer stage is where the substrate, resist, and alignment target are held for exposure. This stage has a high degree of accuracy and repeatability along the X and Y axes. The stages can be configured for a variety of wafer sizes, with the ability to scan multiple wafers in a single session. The column contains a series of lenses, apertures and gate electrodes which focus the electron beam. These components work together to optimize the shape, size and intensity of the beam, allowing precise acquisition of patterning data even in a dense environment. MICROTEC MJB3 has a powerful software package which controls the aligner and enables formation of complex layers with accuracy. It can also be configured with an environmental chamber which allows it to operate in the presence of water vapor, humidity and heat. This allows the user to make more precise and repeatable exposures. The combination of the advanced aligner, accurate wafer stage and powerful software, make KARL SUSS MJB 3 suitable for high throughput, high-resolution production of semiconductor circuits and devices. The combination of features also makes it a great choice for custom patterning and prototyping of integrated circuits.