Used KARL SUSS / MICROTEC MJB-55 #9229803 for sale

KARL SUSS / MICROTEC MJB-55
ID: 9229803
Wafer Size: 5"
Mask aligner, 5".
KARL SUSS / MICROTEC MJB-55 mask aligner is an alignment tool for accurate and repeatable lithographic patterning of substrates and wafers. This machine offers a programmable precision alignment and exposure capability with simple maintenance and operation. MICROTEC MJB-55 is capable of producing minimum resolution linewidths of 8 µm and submicron spaces. It offers very tight alignment accuracy, with a minimum achievable overlay accuracy of ≤2 µm. With its advanced photocell beam alignment equipment and automated control, KARL SUSS MJB55 delivers high-precision alignment of patterns at high speed. The device is self-contained, with all components integrated into a single instrument. It is equipped with a vacuum chuck with 5-inch aperture and coverslips, a knife blade and tweezer stage, a diffuser box and a wafer holder. The optical system of MICROTEC MJB55 consists of two liquid-cooled medium pressure mercury vapour lamps and two Kohler illumination stages. The beam-transmissive reticle is held in a vacuum magazine that is easily loaded onto the machine. The alignment mask surface is located in an exposure stage for horizontal scanning. KARL SUSS / MICROTEC MJB55 uses a proprietary beam-transmissive alignment unit combining laser edge detection and brightfield illumination to achieve precision and repeatable patterning. The device employs a motorized Z-axis for fine focus control of the stage and imaging lenses. The exposure is monitored using a high-quality optical machine for edge detection and registration. The integrated control mechanism enables automated and semi-automated operation. MJB-55 is also equipped with a range of safety features, such as proximity sensors, end stops and a shrouded camera. The machine has an easy to use touch screen interface, making setup and operation an efficient process. With its sophisticated design, flexibility and user-friendly operations, it is an ideal instrument for rapid and accurate patterning of substrates and wafers.
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