Used KASPER / EATON / QUINTEL 2001 #9238375 for sale

KASPER / EATON / QUINTEL 2001 is a multi-gigahertz, high-precision mask aligner. It is designed to produce high-precision, small feature masks and wafers for the synthesis of integrated circuits (IC) and other micro-electromechanical (MEMS) devices. This state-of-the-art mask aligner employs a patented direct imaging technique to achieve nanometer-level accuracy. EATON 2001 is equipped with a photomask containing patterned features placed in a precise grid. The photomask is placed on a wafer positioner plate and is exposed to a high-intensity ultra violet (U.V) light radiation. The light is then focused onto the photomask plates using a motorized aligner. The alignment is very accurate and precise and creates a highly uniform patterned grid on the wafer. KASPER 2001 uses a high-precision wafer stepper system to move the wafer from one point to another on the wafer positioner plate. This alignment process is repeatable and allows the mask aligner to produce consistently high-quality and high-resolution images. The stepper system is designed to operate at a maximum speed of one-hundredth of a millimeter per minute. This makes the system very accurate and allows for precise positioning of the photomask plates. QUINTEL 2001 mask aligner also has automatic focus control to ensure accurate and repeatable image formation. This mask aligner also offers mask-to-reticle features. This allows the user to align a photomask and a reticle to produce high-resolution images with ease. 2001 is a highly versatile and advanced mask aligner that is suitable for many applications. This powerful machine can be used for mask manufacturing, photolithography, making photomask plates and reticles, creating micro-electronic test plates and more. It is the perfect solution for those who need high-precision and high-resolution mask aligner systems.